Electron cyclotron resonance plasma process technology.

Electron cyclotron resonance ion sources – physics, technology and future challenges

The performance of Electron Cyclotron Resonance Ion Sources (ECRIS), producing high charge state ions from a great variety of elements, has improved dramatically over the past decades, thus enabling significant advances in accelerator-based nuclear physics. The orderof-magnitude performance leaps of ECR ion sources, e.g. from 15 μA of extracted O in 1974 [1] to 4700 μA in 2016 [2], result from ...

Plasma expansion from a dielectric electron cyclotron resonance source

The boundary conditions in an electron cyclotron resonance (ECR) source have been modified to mimic the operating conditions where current-free double-layers (DLs) have been recently measured in rf helicon plasmas. The plasma is heated or generated by the ECR at 875 G inside a dielectric source tube, and expands into a grounded diffusion chamber (terminated by a glass plate) by a rapidly decrea...

TE 01 Excitation of an Electron Cyclotron Resonance Plasma Source

The uniformity of plasma generation in electron cyclotron resonance (ECR) reactors for materials processing, and the subsequent uniformity of fluxes to the substrate, are generally a function of the mode of the microwave radiation injected into the chamber. In this paper, a finite difference time domain (FDTD) simulation is used to demonstrate the consequences of exciting an ECR reactor using a...

Electron Cyclotron Resonance Ion Source

Electron Cyclotron Resonance Ion Source